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Engineering Thin Films and Nanostructures with Ion Beams by Emile Knystautas
Huff Books
(2346)
US $125.00
大約HK$ 971.80
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US $5.22(大約 HK$ 40.58) USPS Media MailTM.
所在地:Celina, Texas, 美國
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估計於 11月10日 (星期一)至 11月17日 (星期一)之間送達 運送地點 94104
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eBay 物品編號:156660391220
物品細節
- 物品狀況
- Pages
- 590
- Publication Date
- 2005-03-01
- Book Title
- Engineering Thin Films and Nanostructures with Ion Beams
- ISBN
- 9780824724474
關於產品
Product Identifiers
Publisher
CRC Press LLC
ISBN-10
082472447X
ISBN-13
9780824724474
eBay Product ID (ePID)
2309777238
Product Key Features
Number of Pages
592 Pages
Language
English
Publication Name
Engineering Thin Films and Nanostructures with Ion Beams
Publication Year
2005
Subject
Nanoscience, Materials Science / Thin Films, Surfaces & Interfaces, Nanotechnology & Mems, Physics / Nuclear
Type
Textbook
Subject Area
Technology & Engineering, Science
Format
Hardcover
Dimensions
Item Height
1.3 in
Item Weight
32.9 Oz
Item Length
9.3 in
Item Width
6.3 in
Additional Product Features
Intended Audience
College Audience
LCCN
2004-058212
Dewey Edition
22
Illustrated
Yes
Dewey Decimal
621.38152
Table Of Content
Introduction, Single Ion Induced Spike Effects on Thin Metal Films: Observation and Simulation, on Beam Effects in Magnetic Thin Films, Selected Topics in Ion Beam Surface Engineering, Optical Effects of Ion Implantation, Metal Alloy Nanoclusters by Ion Implantation in Silica, Intrinsic Residual Stress Evolution in Thin Films During Energetic Particle Bombardment, Industrial Aspects of Ion Implantation Equipment and Ion Beam Generation, Nanostructured Transition-Metal Layers, Nuclear Tracks and Nanostructures, Forensic Applications of Ion-Beam Mixing and Surface Spectroscopy of Latent Fingerprints, Glossary
Synopsis
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th, The use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Thin Films and Nanostructures with Ion Beams provides a complete retrospective of the technology and illustrates the wider landscape for which ion beam techniques are becoming increasingly applicable. It includes a CD-ROM with video clips from an electron microscope that details crater formation and annealing by ion beams.
LC Classification Number
TA418.9.T45E52 2004
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- 1***3 (34)- 買家留下的信用評價。過去 6 個月購買已獲認證The book arrived promptly, extremely well packed and in excellent condition. The book is as described looking clean and appearance is as good as new. This book offered me value for money and I look forward to reading it. No problems with ordering from the USA for delivery to the UK. An excellent book seller - I would certainly purchase from Huff Books again. Thank you.The Private Journal of Captain G. F. Lyon of H. M. S. Hecla, During the...(#155774482416)
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- o***r (546)- 買家留下的信用評價。過去 1 年購買已獲認證Prompt and courteous reply to pre-purchase inquiry about packing. Book arrived promptly, securely packed, and in as-described condition. I'm happy with the purchase and recommend the seller.Not much of an engineer by stanley hooker 1984(#156126254462)

